Latest progress in 7 nm high resolution extreme ultraviolet photoresist
TAN Jun-yu, AI Zhao-quan
Key Laboratory for the Synthesis and Application of Organic Functional Molecules of Ministry of Education, College of Chemistry and Chemical Engineering, Hubei University, Wuhan 430062, China
Abstract: Based on chemical elements,molecular structure,and photochemical properties of new photoresist host materials with a resolution of 7 nm or below in the world in recent years,a systematic review is given about the new developments in the research and application of 7 nm extreme ultraviolet photoresist.The prospects for the development direction,opportunities and challenges of 7 nm extreme ultraviolet photoresist are provided.
谭俊玉, 艾照全. 7 nm高分辨率极紫外光刻胶研究新进展[J]. 现代化工, 2022, 42(3): 79-84.
TAN Jun-yu, AI Zhao-quan. Latest progress in 7 nm high resolution extreme ultraviolet photoresist. Modern Chemical Industry, 2022, 42(3): 79-84.
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