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现代化工  2022, Vol. 42 Issue (3): 79-84    DOI: 10.16606/j.cnki.issn0253-4320.2022.03.017
  技术进展 本期目录 | 过刊浏览 | 高级检索 |
7 nm高分辨率极紫外光刻胶研究新进展
谭俊玉, 艾照全
湖北大学化学化工学院, 有机功能分子合成与应用教育部重点实验室, 湖北 武汉 430062
Latest progress in 7 nm high resolution extreme ultraviolet photoresist
TAN Jun-yu, AI Zhao-quan
Key Laboratory for the Synthesis and Application of Organic Functional Molecules of Ministry of Education, College of Chemistry and Chemical Engineering, Hubei University, Wuhan 430062, China
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摘要 从化学元素、分子结构、光化学性能等方面,系统综述了7 nm分辨率极紫外光刻胶研究和应用新进展,展望了未来发展的方向、机遇与挑战。
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谭俊玉
艾照全
关键词:  光刻胶  分子玻璃  极紫外  分辨率  聚合物    
Abstract: Based on chemical elements,molecular structure,and photochemical properties of new photoresist host materials with a resolution of 7 nm or below in the world in recent years,a systematic review is given about the new developments in the research and application of 7 nm extreme ultraviolet photoresist.The prospects for the development direction,opportunities and challenges of 7 nm extreme ultraviolet photoresist are provided.
Key words:  photoresist    molecular glass    extreme ultraviolet    resolution ratio    polymer
收稿日期:  2021-03-01      修回日期:  2021-12-25           出版日期:  2022-03-20
ZTFLH:  TQ57  
作者简介:  谭俊玉(1995-),男,硕士生;艾照全(1957-),男,博士,教授,研究方向为高分子材料的制备及应用,通讯联系人,2326978832@qq.com。
引用本文:    
谭俊玉, 艾照全. 7 nm高分辨率极紫外光刻胶研究新进展[J]. 现代化工, 2022, 42(3): 79-84.
TAN Jun-yu, AI Zhao-quan. Latest progress in 7 nm high resolution extreme ultraviolet photoresist. Modern Chemical Industry, 2022, 42(3): 79-84.
链接本文:  
https://www.xdhg.com.cn/CN/10.16606/j.cnki.issn0253-4320.2022.03.017  或          https://www.xdhg.com.cn/CN/Y2022/V42/I3/79
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