高性能光催化剂是当前光催化技术进入实际应用的关键。g-C₃N₄是具有可见光活性的热门光催化材料,然而因其光生电子-空穴对易复合、光催化性能不高,目前仍难以进入实际应用。为了提升g-C₃N₄的光催化性能,将g-C₃N₄与P₂₅采用简单的静电自组装方法复合,成功制备了P₂₅/g-C₃N₄异质结复合光催化剂。研究发现,在异质结的作用下复合光催化剂中光生电子-空穴对复合得到了有效抑制,光催化性能得到了大幅提升,且其光催化降解性能随P₂₅含量的增加呈先增大后减小的趋势,样品20% P₂₅/g-C₃N₄的光催化性能最大,能在30 min内实现对RhB溶液近70%的降解。

High performance photocatalyst is the key to the practical application of current photocatalyst technology.Graphite phase carbon nitride (g-C₃N₄) is a popular photocatalyst material with visible light activity.However,due to its easy recombination of photogenerated electron and hole pairs,g-C₃N₄ shows a low photocatalytic performance and is still difficult to enter practical applications.In order to improve the photocatalytic performance of g-C₃N₄,a simple electrostatic self-assembly method is used to composite g-C₃N₄ with P₂₅,and P₂₅/g-C₃N₄ heterojunction composite photocatalyst is successfully prepared.It is found that under the action of heterojunction,the recombination between photogenerated electron and hole pair in the composite photocatalyst is effectively inhibited,and the photocatalytic performance is greatly improved.The photocatalytic degradation performance of the composite photocatalyst increases firstly and decrease then with the increasing P₂₅ content.The photocatalytic performance of 20%P₂₅/g-C₃N₄ sample is the best,and it can degrade nearly 70% of RhB solution within 30 minutes.