铋系半导体光催化材料的研究进展

李大玉, 张文超, 周慧, 沈明

现代化工 ›› 2022, Vol. 42 ›› Issue (7) : 32 -36.

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现代化工 ›› 2022, Vol. 42 ›› Issue (7) : 32-36. DOI: 10.16606/j.cnki.issn0253-4320.2022.07.007
技术进展

铋系半导体光催化材料的研究进展

    李大玉, 张文超, 周慧, 沈明
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Research progress about bismuth-based semiconductor photocatalytic materials

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摘要

综述了几类常见的铋系半导体光催化材料,铋系半导体粉末、涂层常用的制备工艺方法;介绍了铋系半导体光催化材料的性能增长机制,以及几种特殊的材料结构(花状,微球状等);最后说明了几种常用铋系半导体材料的不同应用,并展望了未来的研究方向和应用领域。

Abstract

Several common types of bismuth-based semiconductor photocatalytic materials are mainly reviewed,and the commonly used preparation processes for bismuth-based semiconductor powders and coating are also introduced.The performance-growth mechanism of bismuth-based semiconductor photocatalytic materials is expounded,and several special material structures (flower-like,micro-spherical) are also reviewed.Different applications of several commonly used bismuth-based semiconductor materials are explained,and the future research directions and application fields are also prospected.

关键词

铋系半导体 / 涂层 / 光催化 / 纳米结构

Key words

bismuth-based semiconductor / coating / photocatalysis / nano-structure

Author summay

李大玉(1983-),男,博士,副教授,研究方向为功能材料,dyli@yzu.edu.cn

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铋系半导体光催化材料的研究进展[J]. , 2022, 42(7): 32-36 DOI:10.16606/j.cnki.issn0253-4320.2022.07.007

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