噻吩硫化物深度脱除中的反应吸附脱硫机理及吸附剂的研究进展

郭佳伟, 卫藩婧, 王建成, 常丽萍, 廖俊杰

现代化工 ›› 2021, Vol. 41 ›› Issue (2) : 38 -42,49.

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现代化工 ›› 2021, Vol. 41 ›› Issue (2) : 38-42,49. DOI: 10.16606/j.cnki.issn0253-4320.2021.02.008
技术进展

噻吩硫化物深度脱除中的反应吸附脱硫机理及吸附剂的研究进展

    郭佳伟, 卫藩婧, 王建成, 常丽萍, 廖俊杰
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Review on mechanism and adsorbents for deep removal of thiophene by reaction adsorption desulfurization technology

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摘要

对反应吸附脱硫(RADS)机理及其所用吸附剂进行了归纳总结。结果表明,Ni/ZnO和Cu/ZnO是RADS应用最广泛的吸附剂,ZnO载体较小的晶粒尺寸、较大的比表面积、适宜的活性组分含量有利于吸附剂脱硫性能的提高;RADS过程中,噻吩类含硫化合物先吸附在镍、铜活性位上,生成中间产物镍、铜硫化物,随后被H2还原将S转化为H2S,并与ZnO载体发生反应生成ZnS而被吸附。分析认为,为了获得性能优良的Ni/ZnO和Cu/ZnO吸附剂,可通过改变制备手段来实现,沉淀剂和模板剂的选取、结晶条件的改善、金属的掺杂以及焙烧温度的调控等是主要的调控因素。

Abstract

Reaction adsorption desulfurization (RADS) has the advantages of mild reaction conditions,low operating costs,and high desulfurization accuracy,called the most potential desulfurization technology at present.The core of RADS can be summarized as two reactions:thiophene ring opening reaction,and H2S adsorption and removal reaction.Metal oxide adsorbents supported by transition metal are commonly used as RADS adsorbent,which promotes the ring opening of thiophene and the absorption of H2S by metal oxide.At present,Ni/ZnO and Cu/ZnO are the most widely applied adsorbents in RADS.It is shown that the size and specific surface area of the adsorbent carrier,the proportion of active components in the adsorbent and the evaluation conditions of desulfurization are the key factors affecting the desulfurization activity of the adsorbent.Ni/ZnO and Cu/ZnO adsorbents with high activity can be obtained by changing the preparation method,for examples,selection of precipitants and templates,change of crystallization conditions,doping of metals and regulation of calcination temperature.

关键词

噻吩 / 铜基吸附剂 / 镍基吸附剂 / 脱硫机理 / 反应吸附

Key words

thiophene / Cu-derived adsorbent / Ni-derived adsorbent / desulfurization mechanism / reaction adsorption

Author summay

郭佳伟(1995-),男,硕士生

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噻吩硫化物深度脱除中的反应吸附脱硫机理及吸附剂的研究进展[J]. , 2021, 41(2): 38-42,49 DOI:10.16606/j.cnki.issn0253-4320.2021.02.008

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