现代化工

现代化工 ›› 2019, Vol. 39 ›› Issue (7) : 11-16,18. DOI: 10.16606/j.cnki.issn0253-4320.2019.07.003

专论与评述

EUV光刻胶专利分析及技术热点综述

冯刚

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Overview of patent analysis and key technologies for EUV photoresist

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摘要

分析了全球EUV光刻胶领域专利申请态势、主要申请人和技术分布，重点介绍了基体树脂和光产酸剂结构改进方面的技术热点，并展示了有价值的专利技术信息。

Abstract

Application tendency,major applicants and technical distribution of global patents in the field of EUV are analyzed.Key technologies about molecular designing of base resins and structural improvement of photoacid generators are introduced in details.Moreover,valuable patent technical information is presented.