[Author(id=1323047631598351311, tenantId=1226480274814496768, journalId=null, articleId=1240716470394516191, orderNo=null, firstName=null, middleName=null, lastName=null, nameCn=null, orcid=null, stid=null, country=null, authorPic=null, dead=null, email=null, emailSecond=null, emailThird=null, correspondingAuthor=null, authorType=null, ext={CN=AuthorExt(id=null, tenantId=null, journalId=1226484258170171394, articleId=1240716470394516191, authorId=1323047631598351311, language=CN, stringName=周兴, 孙四娟, 霍登平, 王维佳, firstName=null, middleName=null, lastName=null, prefix=null, suffix=null, authorComment=null, nameInitials=null, affiliation=null, department=null, xref=null, address=null, bio=null, bioImg=null, bioContent=null, aboutCorrespAuthor=null)}, companyList=null)]
周兴, 孙四娟, 霍登平, 王维佳.
微波消解-ICP-AES法测定电镀金层中的杂质元素含量[J].
现代化工, 2014, 34(7): 163-166 DOI: