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摘要
从化学元素、分子结构、光化学性能等方面，系统综述了7 nm分辨率极紫外光刻胶研究和应用新进展，展望了未来发展的方向、机遇与挑战。
Abstract
Based on chemical elements,molecular structure,and photochemical properties of new photoresist host materials with a resolution of 7 nm or below in the world in recent years,a systematic review is given about the new developments in the research and application of 7 nm extreme ultraviolet photoresist.The prospects for the development direction,opportunities and challenges of 7 nm extreme ultraviolet photoresist are provided.
关键词
光刻胶
/
聚合物
/
分辨率
/
极紫外
/
分子玻璃
Key words
photoresist
/
polymer
/
resolution ratio
/
extreme ultraviolet
/
molecular glass
Author summay
谭俊玉(1995-),男,硕士生;艾照全(1957-),男,博士,教授,研究方向为高分子材料的制备及应用,通讯联系人,2326978832@qq.com。
7 nm高分辨率极紫外光刻胶研究新进展[J].
, 2022, 42(3): 79-84 DOI:10.16606/j.cnki.issn0253-4320.2022.03.017
