耐HCl和水协同腐蚀、低二次杂质释出是吸附材料用于HCl电子气体深度除水的先决条件。在考察了一系列工业化硅铝酸盐分子筛的耐蚀性、杂质释出和真实HCl电子气体环境下的深度除水性能后证实，硅铝酸盐分子筛的耐蚀性和除水性能与硅铝摩尔比（SiO₂/Al₂O₃摩尔比）密切相关。硅铝摩尔比为2的分子筛耐蚀性较差，硅铝摩尔比为16~360的分子筛均具有较好的耐蚀性；硅铝摩尔比介于2~300之间的分子筛可将HCl电子气体中约2 μL/L水分脱除至130~200 nL/L，除水效率与速度均随硅铝摩尔比增加呈下降趋势。根据上述规律开发的MS-1分子筛可脱除HCl电子气体中的水分至约160 nL/L，MS-1分子筛经改性后则可将水分除至<100 nL/L，且对HCl中的金属离子无显著影响。

High resistance to synergistic corrosion of HCl and moisture as well as negligible emission of secondary impurities are essential properties for a qualified adsorbent to dehydrate deeply HCl electronic gas,considering the fact that HCl is highly hydrophilic,and could be triggered to be strongly corrosive and reactive.Herein a number of commercial aluminosilicate molecular sieves are investigated regarding their corrosion resistance,impurity release and deep dehydration performance for real HCl electronic gas.Results indicate that both corrosion-resistance and dehydrating performance of aluminosilicate molecular sieves are closely tied to their silica to alumina (SiO₂/Al₂O₃) ratios.A ratio of 2 results in poor corrosion resistance whilst those of 16-360 enable excellent corrosion-resistance.Molecular sieves with 2-300 of SiO₂/Al₂O₃ ratio can reduce around 2 μL·L^-1 of moisture in HCl electronic gas down to 130-200 nL·L^-1 level.Both the dehydrating efficiency and speed exhibits a downward trend along with the increase of SiO₂/Al₂O₃ ratio.Accordingly,MS-1 molecular sieve and its modified version have been developed which are capable of removing the moisture in HCl electronic gas down to around 160 and less than 100 nL·L^-1,respectively,without significant contribution to metal impurities in HCl.