Overview of patent analysis and key technologies for EUV photoresist

doi:10.16606/j.cnki.issn0253-4320.2019.07.003

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Modern Chemical Industry ›› 2019, Vol. 39 ›› Issue (7) : 11-16,18. DOI: 10.16606/j.cnki.issn0253-4320.2019.07.003

Overview of patent analysis and key technologies for EUV photoresist

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2019, 39(7): 11-16,18 https://doi.org/10.16606/j.cnki.issn0253-4320.2019.07.003

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Received	Revised	Published
2018-11-22	2019-05-26	2019-07-20
Issue Date
2019-07-13

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