@article{王海霞:1, author = {王海霞, 冯应国, 仲伟科}, title = {中国集成电路用化学品发展现状}, publisher = {现代化工}, year = {2018}, journal = {现代化工}, volume = {38}, number = {11}, eid = {1}, numpages = {6}, pages = {1}, keywords = {集成电路;光刻胶;特种气体;超净高纯试剂;化学机械抛光;硅片}, url = {https://www.xdhg.com.cn/CN/abstract/article_6374.shtml}, doi = {10.16606/j.cnki.issn0253-4320.2018.11.001} }